THOL05  真空/加速器応用・産業利用1  8月9日 特別会議室1 10:00 - 10:20
高強度極端紫外線パルスによる誘電体の非熱的レーザー加工
Non-thermal laser processing of dielectrics by intense extreme ultraviolet pulses
 
○澁谷 達則(産総研),高橋 孝(東大),坂上 和之(早大),ヂン タンフン(量子機構),原 広行,東口 武史(宇都宮大),石野 雅彦(量子機構),小柴 裕也(早大),錦野 将元(量子機構),小川 博嗣,田中 真人(産総研),鷲尾 方一(早大),小林 洋平(東大),黒田 隆之助(産総研)
○Tatsunori Shibuya (AIST), Takashi Takahashi (UTokyo), Kazuyuki Sakaue (Waseda Univ.), Thanh-hung Dinh (QST), Hiroyuki Hara, Takeshi Higashiguchi (Utsunomiya Univ.), Masahiko Ishino (QST), Yuya Koshiba (Waseda Univ.), Masaharu Nishikino (QST), Hiroshi Ogawa, Masahito Tanaka (AIST), Masakazu Washio (Waseda Univ.), Yohei Kobayashi (UTokyo), Ryunosuke Kuroda (AIST)
 
Free electron laser (FEL)-based extreme ultraviolet (EUV) pulse is an attractive option for investigating material interactions in high intensity soft X-ray fields. The study of EUV-matter interaction will build an important database for industrial applications such as EUV femtosecond lithography and direct writing. In this study, EUV laser damage threshold measurement and morphological characteristics of dielectric materials have been reported.